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M06400 - SEMI M64 - 赤外線吸収スペクトル法による絶縁(SI)ガリウムヒ素単結晶内のEL2深いドナー濃度の試験方法 StdPbc-0118 information exchange

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Description

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This specification establishes a set of standards to assist in specifying and ordering large area masks for the Flat Panel Display industry

which will subsequently have much lower stiffness

5  This Standard is a guide for a nondestructive procedure that uses a semicontinuous flat mounting surface and high resolution measurement methods

M06400 - SEMI M64 - 赤外線吸収スペクトル法による絶縁(SI)ガリウムヒ素単結晶内のEL2深いドナー濃度の試験方法 StdPbc-0118 information exchangeglobal Compound Semiconductor Committee20051129global Audits and Reviews Subcommittee20061www. semi. org20063CD ROM SI GaAsEL2 Referenced SEMI Standards SEMI M39 Test Method for Measuring Resistivity and Hall Coefficient and Determining Hall Mobility in Semi Insulating GaAs Single Crystals

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